In the world of electronics, where the quest is always for smaller and faster units with infinite battery life, topological insulators (TI) have tantalizing potential.
In a paper published today in “Science Advances,” Jing Shi, a professor of physics and astronomy at the University of California, Riverside, and colleagues at Massachusetts Institute of Technology (MIT), and Arizona State University report they have created a TI film just 25 atoms thick that adheres to an insulating magnetic film, creating a “heterostructure.” This heterostructure makes TI surfaces magnetic at room temperatures and higher, to above 400 Kelvin or more than 720 degrees Fahrenheit.